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What does IMPVD stand for?

IMPVD stands for Ionized Metal Physical Vapor Deposition

This definition appears very rarely

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Samples in periodicals archive:

H. Zhang, M. Rumer, M. A. Biberger; Scaling of hollow cathode magnetrons for ionized metal physical vapor deposition (Citations: 2) Mark J. Kushner, Vivek Vyas.
Trehch filling by ionized metal physical vapor deposition; Junqing Lu and Mark J. Kushner. Anovel pulsed magnetron sputter technique utilizing...
Low pressure plasma reactors are important tools for ionized metal physical vapor deposition; neutral species due to collisions with Ar+ and the heating of Ar+ due...
Michael J. Grapperhausa. Edit; Design issues in ionized metal physical vapor deposition of copper. Michael J. Grapperhausa Help | Feedback | Follow Us...
Design issues in ionized metal physical vapor deposition of copper - Grapperhaus, Krivokapic, et al. - 1998 1: A two-dimensional axisymmetric model of a...
Lu J and Kushner M J 2000 Effect of sputter heating in ionized metal physical vapor deposition reactors J. Appl. Phys. 87 7198 CrossRef...
modeling plasma equipment and feature profile in ionized metal physical vapor deposition by junqing lu b.s., texas a&m university, 1995 m.s...
low operating pressure condition hollow cathode magnetron plasma reactor ionized metal physical vapor deposition technology kinetics...
Trench Filling by Ionized Metal Physical Vapor Deposition - Lu, Kushner - 2001 1: Atomic-Scale Kinetic Monte Carlo Simulations...
publication » modeling plasma equipment and feature profile in ionized metal physical vapor deposition by.
Ionized metal physical vapor deposition IMPVD is a process in which sputtered metal atoms from a magnetron target are ionized by a secondary plasma, accelerated into...
Abstract. Severe asymmetry of the metal deposits on the trench sidewalls occurs near the wafer edge during low pressure ionized metal physical vapor deposition of Cu...
Trench filling by ionized metal physical vapor deposition
Direct simulation monte carlo modeling of ionized metal physical vapor deposition for semiconductor processing
Dissertation: Modeling Plasma Equipment and Feature Profile in Ionized Metal Physical Vapor Deposition
Title: Magnetron target designs to improve wafer edge trench filling in ionized metal physical vapor deposition: Authors: Lu, J.; Yoon, J.; Shin, K.; Park, B.; Yang, L.
Abstract. Low pressure plasma reactors are an important tool for ionized metal physical vapor deposition (IMPVD), a
(HCM) plasma reactor, a device used to implement the Ionized Metal Physical Vapor Deposition (IMPVD) technology. The DSMC, at the current stage...
Fin03text Document Information; Scaling of hollow cathode magnetrons for ionized metal physical vapor deposition Vivek Vyasa Department of Materials Science and...
an ionized metal physical vapor deposition tool and a high density plasma physical vapor deposition tool...
Magnetron Ionized Metal Physical Vapor Deposition. Junqing Lu Department of Mechanical and Industrial Engineering Mark J. Kushner Department of Electrical and...
Abstract. Ionized metal physical vapor deposition (IMPVD) is a process in which sputtered metal atoms from a magnetron target are ionized by a secondary plasma...
Scaling of hollow cathode magnetrons for ionized metal physical vapor deposition Vyas, Vivek; Kushner, Mark J. Ionized metal physical vapor deposition is being...
Design issues in ionized metal physical vapor deposition of copper. Added by Michael Grapperhaus. potential recommendation reach.